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Web10 mrt. 2015 · A method to form a titanium nitride (TiN) hard mask in the Damascene process of forming interconnects during the fabrication of a semiconductor device, while the type and magnitude of stress carried by the TiN hard mask is controlled. The TiN hard mask is formed in a multi-layered structure where each sub-layer is formed … WebSep 2024 - Aug 20244 years. Centre for Integrated RF Engineering (CIRFE) • Design, EM simulation, microfabrication, and testing of on-chip monolithic integrated RF devices. • 4 years of experience using EM, RF, and multi-physics CAD simulations tools (HFSS, ADS, COMSOL) • On-wafer measurement & characterization of RF devices. gospel acclamation november 6 2022
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